Low-voltage organic transistors and depletion-load inverters with high-K pyrochlore BZN gate dielectric on polymer substrate

被引:46
作者
Choi, Y [1 ]
Kim, ID
Tuller, HL
Akinwande, AI
机构
[1] LG Elect Inst Technol, Devices & Mat Lab, Seoul 137724, South Korea
[2] Korea Inst Sci & Technol, Optoelect Mat Res Ctr, Seoul 130650, South Korea
[3] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[4] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[5] MIT, Microsyst Technol Lab, Cambridge, MA 02139 USA
关键词
Bi1.5Zn1.0Nb1.5O7; high-K dielectric; organic thin-film transistors (OTFTs); pentacene; pyrochlore;
D O I
10.1109/TED.2005.859594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Pentacene organic thin-film transistors (OTFTs) have demonstrated the highest performance among TFTs with an organic semiconductor channel. High operating voltages (20-100 V), stemming from poor capacitive coupling between gate electrode and channel, are a major limitation, particularly for portable battery-powered device applications. OTFTs fabricated on flexible polymer substrates, often characterized by rough surfaces, benefit from the use of high-K dielectrics given the ability to accommodate thicker films which ensure the pinhole-free and good coverage without need to increase operating voltage. As we demonstrate, pyrochlore structured thin films can provide the requisite high dielectric constant coupled with excellent leakage current characteristics, while remaining compatible with the processing requirements of flexible OTFTs. The introduction of an extremely thin parylene film between the BZN dielectric and the pentacene semiconductor markedly shifts the threshold voltage, making it possible to fabricate both enhancement (E) and depletion (D) TFTs. We report the successful fabrication of low-voltage (< 2 V) organic transistors and depletion-load inverter using a 200-nm-thick pyrochlore gate dielectric, Bi1.5Zn1.0Nb1.5O7 (BZN), prepared by a room temperature process. The inverters with depletion load were successfully operated under 5 V with excellent noise margin.
引用
收藏
页码:2819 / 2824
页数:6
相关论文
共 18 条
[1]   Ta2O5 as gate dielectric material for low-voltage organic thin-film transistors [J].
Bartic, C ;
Jansen, H ;
Campitelli, A ;
Borghs, S .
ORGANIC ELECTRONICS, 2002, 3 (02) :65-72
[2]   Low-voltage, 30 nm channel length, organic transistors with a self-assembled monolayer as gate insulating films [J].
Collet, J ;
Tharaud, O ;
Chapoton, A ;
Vuillaume, D .
APPLIED PHYSICS LETTERS, 2000, 76 (14) :1941-1943
[3]   Organic thin-film transistors: A review of recent advances [J].
Dimitrakopoulos, CD ;
Mascaro, DJ .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2001, 45 (01) :11-27
[4]  
Dimitrakopoulos CD, 2002, ADV MATER, V14, P99, DOI 10.1002/1521-4095(20020116)14:2<99::AID-ADMA99>3.0.CO
[5]  
2-9
[6]   Low-voltage organic transistors on plastic comprising high-dielectric constant gate insulators [J].
Dimitrakopoulos, CD ;
Purushothaman, S ;
Kymissis, J ;
Callegari, A ;
Shaw, JM .
SCIENCE, 1999, 283 (5403) :822-824
[7]   Low-voltage organic transistors with an amorphous molecular gate dielectric [J].
Halik, M ;
Klauk, H ;
Zschieschang, U ;
Schmid, G ;
Dehm, C ;
Schütz, M ;
Maisch, S ;
Effenberger, F ;
Brunnbauer, M ;
Stellacci, F .
NATURE, 2004, 431 (7011) :963-966
[8]  
Hong YP, 2002, THIN SOLID FILMS, V419, P183
[9]   Organic thin film transistors: From theory to real devices [J].
Horowitz, G .
JOURNAL OF MATERIALS RESEARCH, 2004, 19 (07) :1946-1962
[10]   High tunability (Ba,Sr)TiO3 thin films grown on atomic layer deposited TiO2 and Ta2O5 buffer layers [J].
Kim, ID ;
Tuller, HL ;
Kim, HS ;
Park, JS .
APPLIED PHYSICS LETTERS, 2004, 85 (20) :4705-4707