Effect of sulphur vacancy on geometric and electronic structure of MoS2 induced by molecular hydrogen treatment at room temperature

被引:51
作者
Kim, Byung Hoon [1 ,2 ]
Park, Min [3 ,4 ]
Lee, Minoh [1 ]
Baek, Seung Jae [3 ,4 ]
Jeong, Hu Young [5 ,6 ]
Choi, Min [1 ]
Chang, Sung Jin [7 ]
Hong, Won G. [7 ]
Kim, Tae Kyung [1 ]
Moon, Hoi Ri [1 ]
Park, Yung Woo [3 ,4 ]
Park, Noejung [1 ]
Jun, Yongseok [8 ]
机构
[1] UNIST, Interdisciplinary Sch Green Energy, Ulsan 689798, South Korea
[2] Incheon Natl Univ, Dept Phys, Inchon 406772, South Korea
[3] Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South Korea
[4] Seoul Natl Univ, Dept Nano Sci & Technol, Seoul 151747, South Korea
[5] UNIST, UNIST Cent Res Facil, Ulsan 689798, South Korea
[6] UNIST, Sch Mech & Adv Mat Engn, Ulsan 689798, South Korea
[7] Korea Basic Sci Inst, Div Mat Sci, Taejon 305806, South Korea
[8] Konkuk Univ, Dept Mat Chem & Engn, Seoul 143701, South Korea
基金
新加坡国家研究基金会;
关键词
TOTAL-ENERGY CALCULATIONS; ADSORPTION; LAYERS; H-2; EVOLUTION;
D O I
10.1039/c3ra42072h
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Investigations into the interaction between molecular hydrogen and molybdenum disulphide have been in increasing demand to improve the understanding of the hydrodesulphurisation process, especially the creation of sulphur vacancies which result in coordinatively unsaturated sites in MoS2. Here we present comprehensive studies of the structural and electronic modulation caused by exposure of MoS2 to H-2 over a low temperature range, which may be helpful for industrial applications. Detail investigations were conducted with Raman spectroscopy, high resolution transmission electron microscopy (HRTEM), and electrical transport properties as a function of H-2 gas pressure up to 24 bar from 295 K to 350 K. Upon exposure to H-2, we observed bond-softening using Raman spectroscopy, a decrease in d-spacing from the TEM results, and an increase in conductance, all of which are consistent with the first-principles calculations. The results demonstrate the formation of sulphur vacancies even under low H-2 pressure at low temperature.
引用
收藏
页码:18424 / 18429
页数:6
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