Nanopatterns by free-standing monolayer films of diblock copolymer micelles with in situ core-corona inversion

被引：104

作者：

Sohn, BH ^{[1
]}

Yoo, SI ^{[1
]}

Seo, BW ^{[1
]}

Yun, SH ^{[1
]}

Park, SM ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Polymer Res Inst, Pohang 790784, South Korea

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2001年 / 123卷 / 50期

关键词：

D O I：

10.1021/ja0170549

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：12734 / 12735

页数：2

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