Improvement of pattern recognition algorithm for drop size measurement

被引：15

作者：

Kim, JY ^{[1
]}

Chu, JH ^{[1
]}

Lee, SY ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Engn Mech, Yusong Gu, Taejon 305701, South Korea

来源：

ATOMIZATION AND SPRAYS | 1999年 / 9卷 / 03期

关键词：

D O I：

10.1615/AtomizSpr.v9.i3.50

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In the present work, the pattern recognition algorithm for drop size measurement has been improved by focusing on the processing of the partially detected or overlapped drop images and the oval-shaped drop images. The improved algorithm was assessed by using an artificially prepared image frame, where the overlapped and the oval-shaped particles are mined with the normal spherical ones (with their hue size distributions known apriori). The results show that both the number of particles recognized and the measurement accuracy are improved significantly.

引用

页码：313 / 329

页数：17