Direct nanopatterning of metal surfaces using self-assembled molecular films

被引：36

作者：

Azzaroni, O

Fonticelli, MH

Benítez, G

Schilardi, PL

Gago, R

Caretti, I

Vázquez, L

Salvarezza, RC

机构：

[1] Natl Univ La Plata, CONICET, Inst Invest Fisicoquim Teor & Aplicadas, RA-1900 La Plata, Argentina

[2] Forschungszentrum Rossendorf EV, Inst Ionenstrahlphys & Materialforsch, D-01314 Dresden, Germany

[3] CSIC, Inst Ciencia Mat, E-28049 Madrid, Spain

来源：

ADVANCED MATERIALS | 2004年 / 16卷 / 05期

关键词：

D O I：

10.1002/adma.200306190

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new method for direct patterning of metal surfaces with sub-50 nm resolution based on molecular films is described (see Figure). Thermal vapor deposition of different metals on chemically surface-modified nanostructured silicon or metallic masters allows direct pattern transfer and easy film detachment. Patterned metallic surfaces are also used as platforms to grow nanostructured hybrid materials by controlled chemical reactions.

引用

收藏

页码：405 / +

页数：6

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