Advanced spatially resolved EELS in the STEM

被引：45

作者：

Batson, PE ^{[1
]}

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Heights, NY 10598 USA

来源：

ULTRAMICROSCOPY | 1999年 / 78卷 / 1-4期

关键词：

STEM instruments; EELS and ADF imaging techniques; atomic level analysis;

D O I：

10.1016/S0304-3991(99)00026-1

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Commercial availability of high spatial resolution STEM instruments is leading to widespread use of EELS and ADF imaging techniques. Future instruments will need to greatly improve levels of stability and accuracy to allow use of these techniques with atomic level precision. I review some experimental results which suggest an urgent need for a 0.1 nm diameter probe with a usable EELS spectral resolution of about 100 meV. (C) 1999 Published by Elsevier Science B.V. All rights reserved.

引用

页码：33 / 42

页数：10

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