Modeling the acceleration field and objective lens for an aberration corrected photoemission electron microscope

被引:9
作者
Feng, J [1 ]
Padmore, H
Wei, DH
Anders, S
Wu, Y
Scholl, A
Robin, D
机构
[1] Lawrence Berkeley Lab, ALS, Berkeley, CA 94710 USA
[2] SRRC, Hsinchu 300, Taiwan
[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
关键词
D O I
10.1063/1.1423631
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The modeling of the optical properties of the acceleration field and objective lens of a photoemission electron microscope (PEEM) is presented. Theory to calculate the aberrations of the extraction field was derived, and extended to include relativistic effects. An analysis of the microscope's electron optical performance and aberrations has been performed using an analytical model as well as a ray tracing method. Ray tracing has the flexibility needed for the assessment of aberrations where the geometry is too complex for analytical methods. This work shows that in the case of a simple PEEM front end of the acceleration gap and objective lens, the all orders ray tracing and full analytical treatments agree to very high precision. This allows us now to use the ray tracing method in situations where analytical methods are difficult, such as an aberration compensating electron mirror. (C) 2002 American Institute of Physics.
引用
收藏
页码:1514 / 1517
页数:4
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