Thin-film growth of the charge-density-wave oxide Rb0.30MoO3

被引:36
作者
vanderZant, HSJ
Mantel, OC
Dekker, C
Mooij, JE
Traeholt, C
机构
[1] DELFT UNIV TECHNOL,DIMES,2628 CJ DELFT,NETHERLANDS
[2] DELFT UNIV TECHNOL,NATL CTR HREM,MAT SCI LAB,2628 AL DELFT,NETHERLANDS
关键词
D O I
10.1063/1.116629
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the thin-film fabrication of a charge-density wave (CDW) compound. Single-phase epitaxial films of the model CDW oxide Rb0.30MoO3 have been grown by pulsed-laser deposition. Detailed analyses show that the Rb0.30MoO3 films have mu m-size grains with the CDW chains oriented parallel to the substrate. On SrTiO3 (510), the CDW chains align into a single direction within the him plane, The electrical resistance of the films demonstrates a CDW state below about 182 K. Structures patterned in films will permit unprecedented studies of phase-coherent CDW transport, as well as the exploration of devices based on CDWs. (C) 1996 American Institute of Physics.
引用
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页码:3823 / 3825
页数:3
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