Thiol diffusion and the role of humidity in "dip pen nanolithography"

被引：153

作者：

Sheehan, PE ^{[1
]}

Whitman, LJ ^{[1
]}

机构：

[1] USN, Res Lab, Washington, DC 20375 USA

来源：

PHYSICAL REVIEW LETTERS | 2002年 / 88卷 / 15期

关键词：

D O I：

10.1103/PhysRevLett.88.156104

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The radii of octadecanethiol spots deposited by an atomic force microscope tip onto a gold surface were studied as a function of contact time and humidity. The deposition is well described by two-dimensional diffusion from an annular source of constant concentration, with a surface diffusion coefficient of 8400 nm(2) s(-1) , independent of humidity. Facile transfer is observed even after near continuous deposition for more than 24 h in a dry N-2 environment, indicating that a water meniscus is not required.

引用

页数：4

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[3]

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