Growth of Y-shaped nanorods through physical vapor deposition

被引:135
作者
Wang, J
Huang, HC [1 ]
Kesapragada, SV
Gall, D
机构
[1] Rensselaer Polytech Inst, Dept Mech Aerosp & Nucl Engn, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
关键词
D O I
10.1021/nl0518425
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
This work presents a proposed mechanism for fabricating Y-shaped nanorods, demonstrates the feasibility of the proposal through classical molecular dynamics simulations, and validates the simulations through magnetron sputter deposition experiments. The proposed mechanism relies primarily on the formation of stacking faults during deposition and to a lesser degree on diffusion kinetics and geometrical shadowing. Applications of the proposed mechanism may enable the design of nanorod arrays with controlled branching.
引用
收藏
页码:2505 / 2508
页数:4
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