CNx thin films prepared by laser chemical vapor deposition

Amorphous CNx thin films with 0.7 less than or equal to x less than or equal to 1.1 were obtained by ArF excimer laser chemical vapor deposition from NH3 and CCl4 as precursors in the substrate temperature range of 200 to 400 degrees C. The slightly brownish films are optically transparent and electrically insulating. They are mechanically stable (several mm free standing at about 100 nm thickness) and very smooth (0.3 nm r.m.s. roughness). They are insoluble in organic solvents, in lyes and in acids except for concentrated sulfuric acid. They are heat resistant up to 600 degrees C but decompose completely at 800 degrees C. (C) 1997 Elsevier Science S.A.