Magnetic force microscopy studies of domain walls in nickel and cobalt films

被引:54
作者
Hsieh, CT [1 ]
Liu, JQ [1 ]
Lue, JT [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Phys, Hsinchu 300, Taiwan
关键词
magnetic domain walls; nickel and cobalt films; magnetic force microscopy;
D O I
10.1016/j.apsusc.2005.05.041
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A magnetic force microscopy is used to examine the domain walls in nickel and cobalt films deposited by argon ion sputtering. Thin nickel films deposited at high substrate temperatures exhibit coexistent Bloch and Neel walls. Films grown at room temperature display alternative Bloch lines with cap switches. These films agglomerate to form grains after annealed at high temperatures. The film composed of larger grains behaves better nucleation implying magnetic domains of closure, while the film composed of smaller grains exhibits more defects implying alternative Bloch lines. We have also observed domain displacements and cap switches, which occur due to precipitation of particles in small grain size films. Stripe domains are observed for film thicknesses larger than 100 nm. They become zigzag cells when an external field of 1.5 T is applied perpendicular to the surface of the films. This experiment indicates that the domain sizes in thin films and the strip widths for thick films both depend on the square-root of the film thickness, which varies from 5 to 45 nm and from 100 to 450 nm, respectively. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1899 / 1909
页数:11
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