Direct laser writing of diffractive array illuminators operable at two wavelengths

被引：14

作者：

Amako, J ^{[1
]}

Nagasaka, K ^{[1
]}

Fujii, E ^{[1
]}

机构：

[1] Seiko Epson Corp, Prod Engn & Dev Dept, Nagano 3990295, Japan

来源：

OPTICAL ENGINEERING FOR SENSING AND NANOTECHNOLOGY (ICOSN 2001) | 2001年 / 4416卷

关键词：

array illuminator; phase grating; dual wavelength reconstruction; laser lithography;

D O I：

10.1117/12.427085

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a grating array illuminator that serves at two different wavelengths. The grating was designed by simulated-annealing method and drawn in photoresist by direct laser lithography that we have developed on optical-disk mastering technology. Upon grating reconstruction with two chosen wavelengths, 1064 and 532nm, from Nd:YAG lasers, two arrays of 9-split beams with the same pitch were reconstructed. The illuminator performance was found rather sensitive to profile errors, which was supported by computer analysis.

引用

页码：360 / 363

页数：4

共 5 条

[1] Use of a two-dimensional array illumination in laser machining for improving throughput [J].

Amako, J ;

Umetsu, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12A) :6425-6428

[2]

AMAKO J, 2000, P 2 INT C OPT DES FA, P261

[3] Kinoforms designed to produce different fan-out patterns for two wavelengths [J].

Bengtsson, J .

APPLIED OPTICS, 1998, 37 (11) :2011-2020

[4] Multiwavelength operation with thin diffractive elements [J].

Sales, TRM ;

Raguin, DH .

APPLIED OPTICS, 1999, 38 (14) :3012-3018

[5]

Vesperinas MN, 1988, J OPT SOC AM A, VA5, P30

← 1 →