Photochemical processes induced by 157-nm light in H2-impregnated glassy SiO2:OH

被引：23

作者：

Mizuguchi, M

Skuja, L

Hosono, H

Ogawa, T

机构：

[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[2] SELETE, Semicond Leading Edge Technol, Totsuka Ku, Yokohama, Kanagawa 2440817, Japan

来源：

OPTICS LETTERS | 1999年 / 24卷 / 13期

关键词：

D O I：

10.1364/OL.24.000863

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

F-2 excimer-laser irradiation induces two major changes in SiO2:OH glass impregnated with H-2 molecules. First, the vacuum-UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm(-1). Second, preexisting free SiOH groups and interstitial H-2 are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si-O bonds that are absorbing in the edge region. (C) 1999 Optical Society of America OCIS codes: 140.0140, 140.2180, 140.3330, 160.6030.

引用

页码：863 / 865

页数：3

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