共 13 条
[3]
157 nm resist materials: Progress report
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2000, 18 (06)
:3396-3401
[4]
Chiba T., 2000, Journal of Photopolymer Science and Technology, V13, P657, DOI 10.2494/photopolymer.13.657
[5]
Dixon DA, 2001, PHYS STATUS SOLIDI B, V226, P69, DOI 10.1002/1521-3951(200107)226:1<69::AID-PSSB69>3.0.CO
[6]
2-7
[7]
*GAUSS INC, 1998, GAUSS 98 REV A 9
[8]
Outlook for 157-nm resist design
[J].
MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2,
1999, 3678
:13-23
[9]
Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2,
2001, 4345
:396-405
[10]
Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2,
2000, 3999
:375-384