Morphology evolution of ZnO(000 (1)over-bar) surface during plasma-assisted molecular-beam epitaxy

被引：57

作者：

Chen, YF

Ko, HJ

Hong, SK

Yao, T

Segawa, Y

机构：

[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan

[2] Inst Phys & Chem Res, Photodynam Res Ctr, Sendai, Miyagi 9800868, Japan

来源：

APPLIED PHYSICS LETTERS | 2002年 / 80卷 / 08期

关键词：

D O I：

10.1063/1.1454229

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Morphology evolution of ZnO(000 (1) over bar) surface during plasma-assisted molecular-beam epitaxy was studied. In a step-flow growth mode, terraces bounded by anisotropic steps, along <11 (2) over bar0>characterize the surface of ZnO epilayers. Adatoms favorably incorporate at upsteps, which translates hexagonal islands to regular terraces with equalized width. Surface morphology is,sensitive to the Zn/O ratio. Oxygen stabilizes mobile Zn adatoms hence oxygen rich conditions result in rough step edges and irregular hexagonal terraces. Steps become smoother with increasing Zn/O ratio until the stoichiometric condition is achieved. As the Zn flux exceeds the stoichiometry, faceted hexagonal pits form on the ZnO(000 (1) over bar) surface. Rather than the lack of surface mobility, the lack of stabilization of adatoms is responsible to the formation of pit. (C) 2002 American Institute of Physics.

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页码：1358 / 1360

页数：3

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