In situ resistivity measurements and optical transmission and reflection spectroscopy of electrochemically loaded switchable YHx films

被引：76

作者：

Kooij, ES ^{[1
]}

van Gogh, ATM ^{[1
]}

Griessen, R ^{[1
]}

机构：

[1] Vrije Univ Amsterdam, Fac Sci, Div Phys & Astron, NL-1081 HV Amsterdam, Netherlands

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1999年 / 146卷 / 08期

关键词：

D O I：

10.1149/1.1392040

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

We describe an experimental method for in situ resistivity measurements during the electrochemical hydrogen loading of thin, switchable metal hydride films. Using an oxygen-free electrolyte we are able to measure the hydrogen concentration in the films quantitatively and to determine the pressure-composition isotherms and the hydrogen concentration dependence of the resistivity. Furthermore, the optical properties can be investigated by simultaneous transmission and reflection spectroscopy. The power of these in situ measurements is discussed on the basis of results obtained on YHx films; possibilities for additional experiments are briefly described. (C) 1999 The Electrochemical Society. S0013-4651(98)11-111-4. All rights reserved.

引用

页码：2990 / 2994

页数：5

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