Rotational temperature measurements of excited and ground states of C2(d3Πg-a3Πu) transition in a H2/CH4 915 MHz microwave pulsed plasma

被引:32
作者
Duten, X [1 ]
Rousseau, A [1 ]
Gicquel, A [1 ]
Leprince, P [1 ]
机构
[1] Univ Paris 13, Lab Ingn Mat & Hautes Press, F-93430 Villetaneuse, France
关键词
D O I
10.1063/1.371515
中图分类号
O59 [应用物理学];
学科分类号
摘要
The rotational temperature of a low energy (0.09 eV), C-2 Swan band state (a (3)Pi u), obtained by white light absorption, is compared to the rotational temperatures of three electronic excited states [C-2(d (3)Pi g),CH(A(2)Delta) and CN(B (2)Sigma(+))] in a high power, H-2/CH4 microwave plasma used for diamond deposition. All temperatures are measured at 50 mbar, and both continuous (as a function of microwave power) and pulsed (as a function of time after the pulse) modes of operation are investigated. The rotational temperature of C-2's excited state is found to be higher than that of the low energy state (assumed equal to the gas temperature), indicating that the excitation of C-2 is to a large extent the result of chemical reactions (chemiluminescence) rather than electronic excitation. The rotational temperatures of CH(A (2)Delta) and CN(B (2)Sigma(+)) excited states are also higher than that for C-2's low energy state temperature. (C) 1999 American Institute of Physics. [S0021-8979(99)09320-2].
引用
收藏
页码:5299 / 5301
页数:3
相关论文
共 16 条
[1]  
BLEEKRODE R, 1967, PHILIPS RES REP S, V7
[2]   The influence of the gas velocity on dissociation degree and gas temperature in a flowing microwave hydrogen discharge [J].
Chabert, P ;
Rousseau, A ;
Gousset, G ;
Leprince, P .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (01) :161-167
[3]   MEASUREMENTS OF THE GAS KINETIC TEMPERATURE IN A CH4-H2 DISCHARGE DURING THE GROWTH OF DIAMOND [J].
CHU, HN ;
DENHARTOG, EA ;
LEFKOW, AR ;
JACOBS, J ;
ANDERSON, LW ;
LAGALLY, MG ;
LAWLER, JE .
PHYSICAL REVIEW A, 1991, 44 (06) :3796-3803
[4]   RADIATIVE LIFETIME MEASUREMENTS OF NH AND CH USING ELECTRON-PHOTON DELAYED COINCIDENCE METHOD [J].
CVEJANOVIC, D ;
ADAMS, A ;
KING, GC .
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1978, 11 (09) :1653-1662
[5]   INTENSITY MEASUREMENTS ON C2 (DPI-3(G)-API-3(U)) SWAN BAND SYSTEM .1. INTERCEPT AND PARTIAL BAND METHODS [J].
DANYLEWYCH, LL ;
NICHOLLS, RW .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1974, 339 (1617) :197-+
[6]  
Gicquel A, 1996, J PHYS III, V6, P1167, DOI 10.1051/jp3:1996176
[7]  
GICQUEL A, 1996, DIAM RELAT MATER, V5, P336
[8]   Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition [J].
Hassouni, K ;
Leroy, O ;
Farhat, S ;
Gicquel, A .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1998, 18 (03) :325-362
[9]   LASER MEASUREMENTS OF RADIATIVE LIFETIME OF B2SIGMA+ STATE OF CN [J].
JACKSON, WM .
JOURNAL OF CHEMICAL PHYSICS, 1974, 61 (10) :4177-4182