Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition

被引:77
作者
Hassouni, K [1 ]
Leroy, O [1 ]
Farhat, S [1 ]
Gicquel, A [1 ]
机构
[1] UPN, CNRS, LIMHP, F-93430 Villetaneuse, France
关键词
microwave plasma; diamond deposition; modeling;
D O I
10.1023/A:1021845402202
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
One-dimensional transport models of moderate-pressure H-2 and H-2/CH4 plasmas obtained in a diamond deposition microwave reactor are presented. These models describe the plasma as a thermochemically nonequilibrium flow with three different energy modes. The solution of the one-dimensional plasma transport equations enabled the estimation of plasma species concentrations and temperatures on the axis of the reactor. As far as pure H-2 plasmas are concerned, results showed that the model predictions of gas and vibration temperatures are in good agreement,vith experimental measurements. The model also yields a relatively good qualitative prediction of the variations of H-atom mole fraction with the power density absorbed by the plasma. The results obtained for H-2/CH4 discharges showed that the model prediction on the variations of H-atom mole fraction with methane percentage in the discharge is in good qualitative agreement with experimental results. They also showed that methane is rapidly converted to acetylene before reaching the discharge zone. The concentrations of neutral hydrocarbon species in the reactor are mainly governed by thermal chemistry. The addition of methane strongly affects the ionization kinetics of the plasma. Three major ions are generally obtained in H-2/CH4 plasmas: C2H2+, C2H3+, and C2H5+. The relative predominance of these ions depends on the considered plasma region and on the discharge conditions. The ionic species concentrations are also mainly governed by chemistry, except very near the substrate surface. Finally the use of this transport model along with the surface chemistry model of Goodwin(1) enabled us to estimate the diamond growth rate for several discharge conditions.
引用
收藏
页码:325 / 362
页数:38
相关论文
共 46 条
[1]  
[Anonymous], 2018, HDB IND DIAMONDS DIA
[2]  
BALDWIN SK, 1994, PLASMA CHEM PLASMA P, V14, P169
[3]  
Bird R.B., 2006, TRANSPORT PHENOMENA, Vsecond
[4]   Electron energy distribution functions and rate and transport coefficients of H-2/H/CH4 reactive plasmas for diamond film deposition [J].
Capitelli, M ;
Colonna, G ;
Hassouni, K ;
Gicquel, A .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1996, 16 (02) :153-171
[5]   A MATHEMATICAL-MODEL OF SILICON CHEMICAL VAPOR-DEPOSITION - FURTHER REFINEMENTS AND THE EFFECTS OF THERMAL-DIFFUSION [J].
COLTRIN, ME ;
KEE, RJ ;
MILLER, JA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) :1206-1213
[6]   A MATHEMATICAL-MODEL OF THE FLUID-MECHANICS AND GAS-PHASE CHEMISTRY IN A ROTATING-DISK CHEMICAL VAPOR-DEPOSITION REACTOR [J].
COLTRIN, ME ;
KEE, RJ ;
EVANS, GH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (03) :819-829
[7]  
FRENKLACH M, 1989, J APPL PHYS, V65, P5143
[8]  
Gicquel A, 1996, J PHYS III, V6, P1167, DOI 10.1051/jp3:1996176
[9]   DIAMOND DEPOSITION IN A BELL-JAR REACTOR - INFLUENCE OF THE PLASMA AND SUBSTRATE PARAMETERS ON THE MICROSTRUCTURE AND GROWTH-RATE [J].
GICQUEL, A ;
ANGER, E ;
RAVET, MF ;
FABRE, D ;
SCATENA, G ;
WANG, ZZ .
DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) :417-424
[10]  
GICQUEL A, 1997, UNPUB J APPL PHYS