DIAMOND DEPOSITION IN A BELL-JAR REACTOR - INFLUENCE OF THE PLASMA AND SUBSTRATE PARAMETERS ON THE MICROSTRUCTURE AND GROWTH-RATE

被引：51

作者：

GICQUEL, A ^{[1
]}

ANGER, E ^{[1
]}

RAVET, MF ^{[1
]}

FABRE, D ^{[1
]}

SCATENA, G ^{[1
]}

WANG, ZZ ^{[1
]}

机构：

[1] CNRS,MICROSTRUCT & MICROELECTR LAB,F-92225 BAGNEUX,FRANCE

来源：

关键词：

D O I：

10.1016/0925-9635(93)90094-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper describes diamond films that have been grown in a bell-jar (10 cm diameter) microwave plasma reactor, The microstructure, purity of the films and growth rate are controlled by the initial nucleation density, substrate temperature and plasma parameters. The diamond membranes produced have qualities and microstructures which are compatible with X-ray lithographic mask applications.

引用

页码：417 / 424

页数：8

共 12 条

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[5]

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[8]

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[10]

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