Optical properties of GaN grown on Si (111) by gas source molecular beam epitaxy with ammonia

被引：17

作者：

Zubrilov, AS

Nikishin, SA ^{[1
]}

Kipshidze, GD

Kuryatkov, VV

Temkin, H

Prokofyeva, TI

Holtz, M

机构：

[1] Texas Tech Univ, Dept Elect Engn, Lubbock, TX 79409 USA

[2] Texas Tech Univ, Dept Phys, Lubbock, TX 79401 USA

[3] Ioffe Inst, St Petersburg 194021, Russia

来源：

JOURNAL OF APPLIED PHYSICS | 2002年 / 91卷 / 03期

关键词：

D O I：

10.1063/1.1430535

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report a study of the optical properties of GaN grown on Si(111) by gas source molecular beam epitaxy with ammonia. Temperature dependence of edge luminescence was studied in the range of 77-495 K for samples with low background carrier concentrations, as determined by capacitance voltage profiling and Raman spectroscopy, and the results were fitted using Passler's and Varshni's models. We also demonstrate strong correlation between electron concentration in GaN and relative Raman intensity of A(1) (longitudinal optical) and E-2(2) modes. The binding energy of free excitons is estimated to be 29+/-2 meV. The contributions of different mechanisms to free exciton line broadening are discussed. (C) 2002 American Institute of Physics.

引用

页码：1209 / 1212

页数：4

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