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Ion energy distributions in reactive arc evaporation discharges used for deposition of TiN films
被引:9
作者:
Ivanov, I
Ljungcrantz, H
Hakansson, G
Petrov, I
Sundgren, JE
机构:
[1] TIXON AB,S-58273 LINKOPING,SWEDEN
[2] UNIV ILLINOIS,DEPT MAT SCI,COORDINATED SCI LAB,SPRINGFIELD,IL 61801
关键词:
ion energy distribution;
reactive arc-evaporation;
deposition;
TiN films;
D O I:
10.1016/S0257-8972(96)03152-0
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
In this paper we report on measured ion energy distributions in are discharges operated with a titanium cathode in nitrogen gas pressures between 0 and 45 mTorr. An electrostatic retarding field analyser (RFA) was used to decelerate and filter ions, depending on their energy-to-charge ratio E/z. The RFA was placed at two distances from the Ti-cathode, L=20 and 40 cm. The differentiated ion spectra were used to determine the ion energy distribution function (IEDF) and the average ion energy [E]. Gaussian fitting functions were used to reveal the possible contributions from single- and multiple-charged Ti ions to the net ion current. The measurements showed that the average energy [E] and current density j of Ti ions decreases as a result of their interaction with N-2-molecules. Both [E] and j decreases with a factor of similar to 10, from 60 to 6 eV and 6 to 0.5 mA cm(-2), respectively, as the nitrogen pressure is increased from 0 to 45 mTorr.
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页码:150 / 156
页数:7
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