Ion energy distributions in reactive arc evaporation discharges used for deposition of TiN films

被引:9
作者
Ivanov, I
Ljungcrantz, H
Hakansson, G
Petrov, I
Sundgren, JE
机构
[1] TIXON AB,S-58273 LINKOPING,SWEDEN
[2] UNIV ILLINOIS,DEPT MAT SCI,COORDINATED SCI LAB,SPRINGFIELD,IL 61801
关键词
ion energy distribution; reactive arc-evaporation; deposition; TiN films;
D O I
10.1016/S0257-8972(96)03152-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper we report on measured ion energy distributions in are discharges operated with a titanium cathode in nitrogen gas pressures between 0 and 45 mTorr. An electrostatic retarding field analyser (RFA) was used to decelerate and filter ions, depending on their energy-to-charge ratio E/z. The RFA was placed at two distances from the Ti-cathode, L=20 and 40 cm. The differentiated ion spectra were used to determine the ion energy distribution function (IEDF) and the average ion energy [E]. Gaussian fitting functions were used to reveal the possible contributions from single- and multiple-charged Ti ions to the net ion current. The measurements showed that the average energy [E] and current density j of Ti ions decreases as a result of their interaction with N-2-molecules. Both [E] and j decreases with a factor of similar to 10, from 60 to 6 eV and 6 to 0.5 mA cm(-2), respectively, as the nitrogen pressure is increased from 0 to 45 mTorr.
引用
收藏
页码:150 / 156
页数:7
相关论文
共 23 条
[21]   ION SPECTRA OF THE METAL VAPOR VACUUM-ARC ION-SOURCE WITH COMPOUND AND ALLOY CATHODES [J].
SASAKI, J ;
BROWN, IG .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (01) :586-588
[22]   PLASMA AND DEPOSITION ENHANCEMENT BY MODIFIED ARC EVAPORATION SOURCE [J].
SATHRUM, P ;
COLL, BF .
SURFACE & COATINGS TECHNOLOGY, 1992, 50 (02) :103-109
[23]   RESONANCE CHARGE-TRANSFER, TRANSPORT CROSS-SECTIONS, AND COLLISION INTEGRALS FOR N+(3P)-N(4S0) AND O+(4S0)-O(3P) INTERACTIONS [J].
STALLCOP, JR ;
PARTRIDGE, H ;
LEVIN, E .
JOURNAL OF CHEMICAL PHYSICS, 1991, 95 (09) :6429-6439