Spin-flip scattering at Al surfaces

被引：16

作者：

Poli, N. ^{[1
]}

Urech, M. ^{[1
]}

Korenivski, V. ^{[1
]}

Haviland, D. B. ^{[1
]}

机构：

[1] Royal Inst Technol, Albanova Univ Ctr, SE-10691 Stockholm, Sweden

来源：

JOURNAL OF APPLIED PHYSICS | 2006年 / 99卷 / 08期

关键词：

D O I：

10.1063/1.2159395

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nonlocal measurements are performed on a multiterminal device to in situ determine the spin-diffusion length and in combination with resistivity measurements also the spin-relaxation time in Al films. By varying the thickness of Al we determine the contribution to spin relaxation from surface scattering. From the temperature dependence of the spin-diffusion length it is established that the spin relaxation is impurity dominated at low temperature. A comparison of the spin- and momentum-relaxation lengths for different thicknesses reveals that the spin-flip scattering at the surfaces is weak compared to that within the bulk of the Al films. (C) 2006 American Institute of Physics.

引用

页数：3

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