Midinfrared intersubband electroluminescence of Si/SiGe quantum cascade structures

被引:54
作者
Bormann, I [1 ]
Brunner, K
Hackenbuchner, S
Zandler, G
Abstreiter, G
Schmult, S
Wegscheider, W
机构
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[2] Univ Regensburg, Inst Angew & Expt Phys, D-93040 Regensburg, Germany
关键词
D O I
10.1063/1.1465131
中图分类号
O59 [应用物理学];
学科分类号
摘要
Unipolar intersubband lasers like quantum cascade laser structures might be realized not only in III-V semiconductors but also in Si/SiGe multiple layer structures since no optical transitions across the indirect band gap are involved. We report on well-defined intersubband electroluminescence emission of Si/SiGe quantum cascade structures with different active quantum wells parameters. The complex valence band structure and a nonradiative relaxation rate of about 400 fs were calculated by multiband k.p formalism including Si/Ge segregation effects. The observed spectral shift of the electroluminescence peak from 146 to 159 meV is described well by quantum confinement of the two lowest heavy hole subbands. The electroluminescence observed reveals transverse magnetic polarization, a spectral line shape that changes with the direction of the current, and low-energy line broadening with an increase in temperature and current. All these features are described well by the k.p model calculation. (C) 2002 American Institute of Physics.
引用
收藏
页码:2260 / 2262
页数:3
相关论文
共 13 条
[1]   Intersubband electroluminescence from silicon-based quantum cascade structures [J].
Dehlinger, G ;
Diehl, L ;
Gennser, U ;
Sigg, H ;
Faist, J ;
Ensslin, K ;
Grützmacher, D ;
Müller, E .
SCIENCE, 2000, 290 (5500) :2277-+
[2]   RELAXATION OF STRAINED-LAYER SEMICONDUCTOR STRUCTURES VIA PLASTIC-FLOW [J].
DODSON, BW ;
TSAO, JY .
APPLIED PHYSICS LETTERS, 1987, 51 (17) :1325-1327
[3]   QUANTUM CASCADE LASER [J].
FAIST, J ;
CAPASSO, F ;
SIVCO, DL ;
SIRTORI, C ;
HUTCHINSON, AL ;
CHO, AY .
SCIENCE, 1994, 264 (5158) :553-556
[4]   HOLE ENERGY-LEVELS AND INTERSUBBAND ABSORPTION IN MODULATION-DOPED SI/SI1-XGEX MULTIPLE-QUANTUM WELLS [J].
FROMHERZ, T ;
KOPPENSTEINER, E ;
HELM, M ;
BAUER, G ;
NUTZEL, JF ;
ABSTREITER, G .
PHYSICAL REVIEW B, 1994, 50 (20) :15073-15085
[5]   SELF-LIMITATION IN THE SURFACE SEGREGATION OF GE ATOMS DURING SI MOLECULAR-BEAM EPITAXIAL-GROWTH [J].
FUKATSU, S ;
FUJITA, K ;
YAGUCHI, H ;
SHIRAKI, Y ;
ITO, R .
APPLIED PHYSICS LETTERS, 1991, 59 (17) :2103-2105
[6]   GE SURFACE SEGREGATION AT LOW-TEMPERATURE DURING SIGE GROWTH BY MOLECULAR-BEAM EPITAXY [J].
GODBEY, DJ ;
LILL, JV ;
DEPPE, J ;
HOBART, KD .
APPLIED PHYSICS LETTERS, 1994, 65 (06) :711-713
[7]   GE PROFILE FROM THE GROWTH OF SIGE BURIED LAYERS BY MOLECULAR-BEAM EPITAXY [J].
GODBEY, DJ ;
ANCONA, MG .
APPLIED PHYSICS LETTERS, 1992, 61 (18) :2217-2219
[8]   Ultrafast dynamics of intersubband excitations in a quasi-two-dimensional hole gas [J].
Kaindl, RA ;
Wurm, M ;
Reimann, K ;
Woerner, M ;
Elsaesser, T ;
Miesner, C ;
Brunner, K ;
Abstreiter, G .
PHYSICAL REVIEW LETTERS, 2001, 86 (06) :1122-1125
[9]   ELECTRONIC-BAND PARAMETERS IN STRAINED SI(1-X)GE(X) ALLOYS ON SI(1-Y)GE(Y) SUBSTRATES [J].
RIEGER, MM ;
VOGL, P .
PHYSICAL REVIEW B, 1993, 48 (19) :14276-14287
[10]   High-power infrared (8-micrometer wavelength) superlattice lasers [J].
Scamarcio, G ;
Capasso, F ;
Sirtori, C ;
Faist, J ;
Hutchinson, AL ;
Sivco, DL ;
Cho, AY .
SCIENCE, 1997, 276 (5313) :773-776