Argon temperature and density versus the input power in a high pressure planar magnetron discharge

Experimental and theoretical studies of sputtered atoms transport, between target and substrate, give some understanding about the behaviour of the deposition rate in magnetron cathode glow discharges. The present work refers to an experimental study about the dependence of deposition rate, R, on pressure, in an Ar magnetron discharge on a Cu target, at a pressure range extending from 10 to 67Pa. The experimental results show that R is inversely proportional to pressure, supporting the predictions of a diffusive model for the transport of the sputtered atoms, from the cathode to the substrate, proposed by Helmer and Wickersham. From the results and extending that model, the argon temperature and density, as well as the mean free path of target atoms in the region between cathode and substrate, have been obtained as a function of discharge power. (C) 2002 Elsevier Science Ltd. All rights reserved.