Preparation of cobalt oxide thin films and its use in supercapacitor application

被引:264
作者
Kandalkar, S. G. [1 ]
Gunjakar, J. L. [1 ]
Lokhande, C. D. [1 ]
机构
[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India
关键词
cobalt oxide; thin films; cyclic voltammetry; supercapacitor; charge-discharge;
D O I
10.1016/j.apsusc.2008.02.163
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Present work explored a room temperature, simple and low cost chemical route for the cobalt oxide film onto copper substrate from cobalt chloride (CoCl2 center dot 6H(2)O) precursor and characterization for its structural and electrochemical properties for supercapacitor application. The morphology and crystal structure of the film were investigated by scanning electron microscopy and X- ray diffraction techniques, respectively. The electrochemical supercapacitive properties of cobalt oxide film were evaluated using cyclic voltammetry and galvanostatic charge-discharge methods. The film showed maximum specific capacitance of (165 F/g) in 1.0 M aqueous KOH electrolyte at scan rate 10 mV/s. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:5540 / 5544
页数:5
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