Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitors

被引：142

作者：

Kim, HK

Seong, TY

Lim, JH

Cho, WI

Yoon, YS

机构：

[1] KIST, Thin Film Technol Res Ctr, Seoul 130650, South Korea

[2] KIST, Battery & Fuel Cell Ctr, Seoul 130650, South Korea

[3] K JIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea

来源：

JOURNAL OF POWER SOURCES | 2001年 / 102卷 / 1-2期

关键词：

thin-film; supercapacitor; Co3O4; LiPON electrolyte; gas-ratio; capacitance;

D O I：

10.1016/S0378-7753(01)00864-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The electrochemical and structural properties of cobalt oxide films which are deposited at different sputtering gas-ratios Of O-2/(Ar + O-2) are investigated. In order to examine the electrochemical properties of the as-deposited films, all solid-state thin-film. supercapacitors (TFSCs) are fabricated. There Consist Of Co3O4 electrodes and an amorphous LiPON thin-film electrolyte. It is shown that the capacitance behaviour of the Co3O4/LiPON/Co3O4 TFSCs is similar to bulk-type supercapacitor behaviour. It is further shown that the electrochemical behaviour of the TFSCs is dependent on the sputtering gas-ratios. The gas-ratio dependence of the capacitance of the oxide electrode films is discussed based on X-ray diffraction (XRD) and electrical results for the Co3O4 films. (C) 2001 Published by Elsevier Science B.V.

引用

页码：167 / 171

页数：5

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