Microfabrication of a fluoropolymer film using conventional XeCl excimer laser by laser-induced backside wet etching

被引：38

作者：

Wang, J ^{[1
]}

Niino, H ^{[1
]}

Yabe, A ^{[1
]}

机构：

[1] Natl Inst Mat & Chem Res, Tsukuba, Ibaraki 3058565, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1999年 / 38卷 / 7A期

关键词：

microfabrication; fluoropolymer; XeCl excimer laser; laser ablation; wet etching;

D O I：

10.1143/JJAP.38.L761

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The surface of a fluoropolymer film was fabricated with micron-sized features by laser-induced backside wet etching (LIBWE), using a nanosecond XeCl excimer laser at 308 nm. The etch rate ranged from 5 to 20 nm/pulse by laser irradiation at fluences varying from 160 to 500 mJ/cm(2). The threshold fluence for etching was about 100 mJ/cm(2) in the case of a tetrahydrofuran (THF) solution containing pyrene. The mechanism of LIBWE is explained by the formation of superheated liquid in a cyclic multiphotonic absorption process.

引用

页码：L761 / L763

页数：3

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