Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc

被引：18

作者：

Bilek, MMM ^{[1
]}

Chhowalla, M ^{[1
]}

Weiler, M ^{[1
]}

Milne, WI ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM ROSSENDORF EV, INST IONENSTRAHL & MAT FORSCH, D-01314 DRESDEN, GERMANY

来源：

JOURNAL OF APPLIED PHYSICS | 1996年 / 79卷 / 03期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.362654

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The plasma generated by a silicon filtered cathodic vacuum are has been investigated using a Faraday cup and Langmuir probes. Ion energy distributions for are currents ranging from 30 to 80 A were measured. Mean ion energies were found to range from 8 to 18 eV. The ion saturation current density varied from 0.1 to 1 mA/cm(2) depending on both the are and filter coil currents, The energy distributions were fitted by a sum of Gaussians spaced according to the gas dynamic model for ion acceleration at the cathode spot. (C) 1996 American Institute of Physics.

引用

页码：1287 / 1291

页数：5

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