Interface imaging by second-harmonic microscopy

被引:17
作者
Florsheimer, M
Bosch, M
Brillert, C
Wierschem, M
Fuchs, H
机构
[1] Physical Institute, University of Münster
[2] Swiss Fed. Institute of Technology, ETH-Hönggerberg, CH-8093, Zurich
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 04期
关键词
D O I
10.1116/1.589401
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Second-harmonic microscopy (SHM) is a fast noncontact surface specific imaging technique for the quantitative in situ characterization of a large variety of real interfaces including liquid surfaces, surfaces in vacuum, and buried interfaces. The conventional surface second-harmonic generation experiment reveals the surface order and symmetry averaged over the area illuminated with an intense laser beam. In contrast, the SHM experiment probes the interface laterally resolved. Here we show that the optical nonlinearity of any local feature resolved in an image can be measured quantitatively. The nonlinear optical properties can be interpreted in terms of local surface order and symmetry. The lateral resolution limit of the stigmatic microscope is Abbe's resolution for the generated SH light with a wavelength of, e.g., 532 nm. The contrast mechanism can also be applied to a scanning optical near field microscope. (C) 1997 American Vacuum Society. [S0734-211X(97)04304-7].
引用
收藏
页码:1564 / 1568
页数:5
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