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Conditions for efficient spin injection from a ferromagnetic metal into a semiconductor -: art. no. 184420
被引:891
作者:
Fert, A
Jaffrès, H
机构:
[1] CNRS, THALES, Unite Mixte Phys, F-91404 Orsay, France
[2] Univ Paris 11, F-91405 Orsay, France
关键词:
D O I:
10.1103/PhysRevB.64.184420
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
We adapt the spin accumulation model of the perpendicular transport in metallic magnetic multilayers to the issue of spin injection from a ferromagnetic metal (F) into a semiconductor (N). We show that the problem of the conductivity mismatch between F and N can be solved by introducing a spin dependent inter-face resistance (tunnel junction preferably) at the F/N interfaces. In the case of a F/N/F structure, a significant value of the magnetoresistance can be obtained if the junction resistance at the F/N and N/F interfaces is chosen between two threshold values depending on the resistivity, spin diffusion length and thickness of N. The problem is treated for various geometries (vertical or lateral F/N/F structures).
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