Transient behavior of Hg1-xCdxTe films deposited on (100)CdTe substrates by chemical vapor transport

被引:4
作者
Wiedemeier, H
Ge, YR
机构
[1] Department of Chemistry, Rensselaer Polytechnic Institute, Troy
关键词
chemical vapor transport (CVT); epitaxial growth; HgCdTe; mass flux; transient behavior;
D O I
10.1007/BF02659906
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The growth history of Hg1-xCdxTe films deposited on (100) CdTe substrates by chemical vapor transport (CVT) has been studied, for the first time, by using a transient growth technique. The observed morphological evolution of Hg1-xCdxTe films deposited at 545 degrees C shows a transition behavior from three-dimensional (3D) islands to two-dimensional (2D) layer growth. The experimental results indicate that the so-called critical time needed for the above morphological transition is about 1h under present experimental conditions. Based on the chemical bonding properties of Hg1-xCdxTe, and on the behavior of the morphological transition, the Stranski-Krastanov growth mode is suggested for the epitaxial growth system. The time dependence of the growth thickness, of the growth rate (R(100)) along the [100] direction, and of the surface composition all reveal a transient behavior. These are related to the nature of the Hg1-xCdxTe/(100)CdTe heterojunction and to the surface reactions. Comparison of the growth rates and of the total mass deposited as a function of time shows the relationship between epitaxial growth and mass flux of the Hg1-xCdxTe-HgI2 chemical vapor transport system.
引用
收藏
页码:1072 / 1081
页数:10
相关论文
共 16 条
[1]  
AQUILANO D, 1989, CRYSTAL GROWTH SCI T, V210, P62
[2]  
CHANDRA D, 1986, Z ANORG ALLG CHEM, V545, P98
[3]  
CHERNOV AA, 1984, SPRINGER SERIES SOLI, V36, P99
[4]   THE EFFECT OF GROWTH ORIENTATION ON THE MORPHOLOGY, COMPOSITION, AND GROWTH-RATE OF MERCURY CADMIUM TELLURIDE LAYERS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY [J].
CINADER, G ;
RAIZMAN, A ;
SHER, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (03) :1634-1638
[5]   STUDY OF TEMPERATURE-DEPENDENT STRUCTURAL-CHANGES IN MOLECULAR-BEAM EPITAXY GROWN HG1-XCDXTE BY X-RAY LATTICE-PARAMETER MEASUREMENTS AND EXTENDED X-RAY ABSORPTION FINE-STRUCTURE [J].
DIMARZIO, D ;
LEE, MB ;
DECARLO, J ;
GIBAUD, A ;
HEALD, SM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (03) :1886-1891
[6]   DEPENDENCE OF THE VACUUM SUBLIMATION RATE OF CDTE UPON CRYSTALLOGRAPHIC ORIENTATION [J].
DUBOWSKI, JJ ;
WROBEL, JM ;
WILLIAMS, DF .
APPLIED PHYSICS LETTERS, 1988, 53 (08) :660-662
[7]   Characteristics of island growth of Hg1-xCdxTe on (100)CdTe substrates by chemical vapor transport [J].
Ge, YR ;
Wiedemeier, H .
JOURNAL OF ELECTRONIC MATERIALS, 1996, 25 (07) :1067-1071
[8]   CRYSTAL DEFECTS AND INTERDIFFUSION BEHAVIOR OF HG1-XCDXTE/(100)CDTE EPITAXIAL LAYERS GROWN BY CHEMICAL-VAPOR TRANSPORT [J].
GE, YR ;
WIEDEMEIER, H .
JOURNAL OF ELECTRONIC MATERIALS, 1994, 23 (11) :1221-1227
[9]   NEW DEFECT ETCHANTS FOR CDTE AND HG1-XCDXTE [J].
HAHNERT, I ;
SCHENK, M .
JOURNAL OF CRYSTAL GROWTH, 1990, 101 (1-4) :251-255
[10]   THEORY OF POLAR SEMICONDUCTOR SURFACES [J].
HARRISON, WA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1492-1496