DEPENDENCE OF THE VACUUM SUBLIMATION RATE OF CDTE UPON CRYSTALLOGRAPHIC ORIENTATION

被引：20

作者：

DUBOWSKI, JJ ^{[1
]}

WROBEL, JM ^{[1
]}

WILLIAMS, DF ^{[1
]}

机构：

[1] MICROELECTR TECHNOL OFF,INFORMAT TECHNOL IND BRANCH,OTTAWA K1A 0H5,ONTARIO,CANADA

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 08期

关键词：

D O I：

10.1063/1.99843

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：660 / 662

页数：3

共 12 条

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