Modification of polysulfone membranes 4. Ammonia plasma treatment

The effect of NH(3) and NH(3)/Ar plasma on ultrafiltration polysulfone membranes have been studied. Results of contact angle, FTIR-ATR and X-ray photoelectron spectroscopy experiments clearly showed that both plasmas introduced hydrophilic, nitrogen- and oxygen-containing moieties on the polymer surface and that NH(3)/Ar plasma was more efficient. That plasma was also more aggressive-signs of strong etching could be seen on the SEM pictures. Redeposition of etched material seemed to take place inside the pores. On the contrary, ammonia plasma was soft and caused cleaning the surface and pores enlargement. Performance of ammonia plasma modified membranes was greatly improved and independent on solution pH. The last observation proved amphoteric character of the surface. NH(3)/Ar plasma treatment gave membranes of acidic surface and filtration indices not so good as for ammonia plasma. (C) 2002 Published by Elsevier Science Ltd.