Spin injection from a ferromagnetic metal into a semiconductor

被引:36
作者
Jaffrès, H
Fert, A
机构
[1] THALES, CNRS, Unite Mixte Phys, F-91405 Orsay, France
[2] Univ Paris 11, F-91405 Orsay, France
关键词
D O I
10.1063/1.1451887
中图分类号
O59 [应用物理学];
学科分类号
摘要
We calculate the spin polarization of electrons injected from a ferromagnetic metal (F) into a semiconductor (SC) or a two-dimensional semiconductor electron gas (2-DEG) and the resulting magnetoresistance (MR) of a F/SC/F structure. Due to the conductivity mismatch between F and SC, efficient spin-injection can be obtained only by inserting a tunnel junction at the F/N interfaces. We find that a F-1/SF/F-2 structure can present a nonzero MR if the junction resistance is chosen in a relatively narrow range determined by the spin-diffusion length and resistivity of F and SC, the distance between the ferromagnets and the width of the conduction channels. The case of a 2-DEG is particularly favorable. (C) 2002 American Institute of Physics.
引用
收藏
页码:8111 / 8113
页数:3
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