Contact characteristics in GaN nanowire devices

被引:40
作者
Ham, MH [1 ]
Choi, JH [1 ]
Hwang, W [1 ]
Park, C [1 ]
Lee, WY [1 ]
Myoung, JM [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
关键词
D O I
10.1088/0957-4484/17/9/021
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
GaN nanowire field-effect transistors were fabricated using single-crystalline GaN nanowires synthesized by thermal evaporation of GaN powder with NH3. They were found to be depletion mode transistors with an electron concentration of similar to 10(7) cm(-1), electron mobility of 50 cm(2) V-1 s(-1), and on/off current ratio of similar to 10(2). Using the transmission line method, the resistivity of the GaN nanowires and specific contact resistivity were estimated to be 7.8 x 10(-2) Omega cm and 1.7 x 10(-5) Omega cm(2), respectively. The current transport at contacts was described by the thermionic emission with a barrier height of 68 meV. The contact characteristics were improved by supplying excess carriers in the nanowires. These results will enable GaN nanowires to be used in reliable nanoscale devices.
引用
收藏
页码:2203 / 2206
页数:4
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