Structural and optical properties of strain-relaxed InAsP/InP heterostructures grown by metalorganic vapor phase epitaxy on InP(001) using tertiarybutylarsine

被引:13
作者
Desjardins, P
Beaudoin, M
Leonelli, R
LEsperance, G
Masut, RA
机构
[1] ECOLE POLYTECH,DEPT GENIE PHYS,MONTREAL,PQ H3C 3A7,CANADA
[2] UNIV MONTREAL,GRP RECH PHYS & TECHNOL COUCHES MINCES,MONTREAL,PQ H3C 3J7,CANADA
[3] UNIV MONTREAL,DEPT PHYS,MONTREAL,PQ H3C 3J7,CANADA
[4] ECOLE POLYTECH,CTR CARACTERISAT MICROSCOP MAT,MONTREAL,PQ H3C 3A7,CANADA
[5] ECOLE POLYTECH,DEPT MET & GENIE MAT,MONTREAL,PQ H3C 3A7,CANADA
关键词
D O I
10.1063/1.362921
中图分类号
O59 [应用物理学];
学科分类号
摘要
A combination of transmission electron microscopy and high-resolution x-ray diffraction analyses has been used to determine the exact strain in each layer of InAsP/InP multiple-quantum-well structures grown by metalorganic vapor phase epitaxy on InP(001) using trimethylindium, tertiarybutylarsine, and phosphine as precursors. The strain-relaxed structures are characterized by misfit dislocations located exclusively at (i) the interface between the buffer layer and the multilayer, and (ii) the interface between the multilayer and the cap layer. The low-temperature optical absorption spectra show well resolved excitonic transitions that are significantly shifted by strain relaxation. The spectra are analyzed with a solution to the Schrodinger equation in the envelope function formalism using the Bastard-Martin model. The energies for the major transitions involving light- and heavy-holes are predicted accurately for all samples, allowing the determination of the heterojunction band offset. The heavy- and light-hole exciton binding energies deduced from that analysis range from 5 to 7 meV and 2 to 5 meV, respectively. The absolute values of the conduction band offset (expressed in meV) are consistent with the predictions of the quantum dipole model [J. Tersoff, Phys. Rev. B 30, 4874 (1984)] when calculating the midgap energy using a linear Interpolation or the InAsP ternary composition between the values for the binaries InAs and InP. The absolute value of conduction band offset (in meV), which is dictated by the composition of the ternary layer, does not significantly depend on the degree of strain relaxation of the: multilayer, However, the effect of this strain-relaxation on the InP and InAsP band gaps causes the conduction band offset to apparently increase from 72 to 82% of the partially-strained band gap difference when the strain-relaxation increases from 0 to 17%. (C) 1996 American Institute of Physics.
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页码:846 / 852
页数:7
相关论文
共 35 条
  • [1] ENERGY BAND-GAP SHIFT WITH ELASTIC STRAIN IN GAXIN1-XP EPITAXIAL LAYERS ON (001) GAAS SUBSTRATES
    ASAI, H
    OE, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) : 2052 - 2056
  • [2] Bastard Gerald, 1988, Wave mechanics applied to semiconductor heterostructures
  • [3] Self-consistent determination of the band offsets in InAsxP1-x/InP strained-layer quantum wells and the bowing parameter of bulk InAsxP1-x
    Beaudoin, M
    Bensaada, A
    Leonelli, R
    Desjardins, P
    Masut, RA
    Isnard, L
    Chennouf, A
    LEsperance, G
    [J]. PHYSICAL REVIEW B, 1996, 53 (04): : 1990 - 1996
  • [4] BEAUDOIN M, 1995, MATER RES SOC SYMP P, V358, P1005
  • [5] MISFIT STRAIN, RELAXATION, AND BAND-GAP SHIFT IN GAXIN1-XP/INP EPITAXIAL LAYERS
    BENSAADA, A
    CHENNOUF, A
    COCHRANE, RW
    GRAHAM, JT
    LEONELLI, R
    MASUT, RA
    [J]. JOURNAL OF APPLIED PHYSICS, 1994, 75 (06) : 3024 - 3029
  • [6] OPTIMIZATION OF MULTIPLE QUANTUM-WELL STRUCTURES FOR WAVE-GUIDE ELECTROABSORPTION MODULATORS
    CHIN, MK
    YU, PKL
    CHANG, WSC
    [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1991, 27 (03) : 696 - 701
  • [7] QUANTUM-WELL PARA-CHANNEL ALGAAS/INGAAS/GAAS HETEROSTRUCTURE INSULATED-GATE FIELD-EFFECT TRANSISTORS WITH VERY HIGH TRANSCONDUCTANCE
    DANIELS, RR
    RUDEN, PP
    SHUR, M
    GRIDER, D
    NOHAVA, TE
    ARCH, DK
    [J]. IEEE ELECTRON DEVICE LETTERS, 1988, 9 (07) : 355 - 357
  • [8] ENQUIST PM, 1987, J CRYST GROWTH, V18, P378
  • [9] ESTIMATION OF PERCENTAGE RELAXATION IN SI/SI1-XGEX STRAINED-LAYER SUPERLATTICES
    HALLIWELL, MAG
    LYONS, MH
    DAVEY, ST
    HOCKLY, M
    TUPPEN, CG
    GIBBINGS, CJ
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (01) : 10 - 15
  • [10] ROOM-TEMPERATURE PSEUDOMORPHIC INXGA1-XAS/GAAS QUANTUM WELL SURFACE-EMITTING LASERS AT 0.94-1.0-MU-M WAVELENGTHS
    HUANG, KF
    TAI, K
    JEWELL, JL
    FISCHER, RJ
    MCCALL, SL
    CHO, AY
    [J]. APPLIED PHYSICS LETTERS, 1989, 54 (22) : 2192 - 2194