Chemical kinetic modelling of non-equilibrium Ar-H2 thermal plasmas

被引:20
作者
Beuthe, TG [1 ]
Chang, JS
机构
[1] Atom Energy Canada Ltd, Whiteshell Labs, Pinawa, MB R0E 1L0, Canada
[2] McMaster Univ, Dept Engn Phys, Hamilton, ON L8S 4M1, Canada
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 7B期
关键词
thermal plasma; thermal ionization; electron impact ionization; chemical kinetics; numerical modelling; thermodynamic non-equilibrium;
D O I
10.1143/JJAP.38.4576
中图分类号
O59 [应用物理学];
学科分类号
摘要
A chemical kinetic model has been constructed to predict the gas and electron temperature dependence of the neutral and ionic species composition in Ar-H-2 mixtures under thermal plasma conditions. The model includes electron impact, thermal impact, ion-molecule, and recombination reactions as well as accounting for diffusion. Important metastable and excited slates of species have been accounted for as well as the presence of neutral molecules, radicals, and atoms, positively and negatively charged atoms and molecular ions, and electrons. All relevant electron temperature, gas temperature and pressure terms have been included. Calculations were performed for electron and gas temperatures between 300 and 15000 K and various pressures. Under equilibrium and non-equilibrium conditions, Ar, H-2, H, ArH3+, Ar+, H+, H- and electrons were found to be the dominant neutral and charged species. No significant negative ion concentrations are observed.
引用
收藏
页码:4576 / 4580
页数:5
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