Surface reconstructions of 3C-SiC(001) studied by high-resolution core-level photoemission

被引:7
作者
Yeom, HW
Chao, YC
Terada, S
Hara, S
Yoshida, S
Uhrberg, RIG
机构
[1] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
[2] Univ Tokyo, Res Ctr Spectrochem, Tokyo 113, Japan
[3] Univ Tokyo, Dept Chem, Tokyo 113, Japan
[4] Electrotech Lab, Tsukuba, Ibaraki 305, Japan
关键词
low index single crystal surface; silicon carbide; soft X-ray photoelectron spectroscopy (using synchrotron radiation); surface relaxation and reconstruction;
D O I
10.1016/S0039-6028(99)00463-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The different surface reconstructions of the 3C-SiC(001) surface have been systematically studied by high-resolution core-level photoelectron spectroscopy. For the Si-rich 3 x 2 surface, three different Si 2p surface components are clearly identified supporting the structure model with 2/3 ML of Si ad-dimers. It is confirmed that the c(2 x 2) and 2 x 1 surfaces are respectively C- and Si-terminated by observing a single dominant surface component in the C 1s or Si 2p spectra with binding energy shifts of 1.04 eV and -0.50 eV respectively relative to the bulk component. The atomic origins of these surface core levels are assigned and the core-level shifts are compared with previous measurements and recent theoretical calculations. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:392 / 396
页数:5
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