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Formation of a faceted MoO2 epilayer on Mo(112) studied by XPS, UPS and STM
被引:107
作者:
Schroeder, T
Zegenhagen, J
Magg, N
Immaraporn, B
Freund, HJ
机构:
[1] ESRF, F-38043 Grenoble, France
[2] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
关键词:
X-ray photoelectron spectroscopy;
visible and ultraviolet photoelectron spectroscopy;
scanning tunneling microscopy;
surface relaxation and reconstruction;
chemisorption;
oxidation;
epitaxy;
faceting;
D O I:
10.1016/j.susc.2004.01.010
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The open trough and row Mo(112) surface serves as substrate for the epitaxial growth Of MoO2. XPS, UPS and STM studies of the oxygen adsorption allow to monitor step-by-step the transformation of the electronic and morphological properties during this process. XPS and UPS spectra reveal that a stable oxygen chemisorbed state precedes the formation Of MoO2. STM topographs identify this oxygen chemisorbed phase as an oxygen-induced p(2 x 3) reconstruction of the missing row type. This precursor state evolves into a flat p(1 x 3) reconstructed (010) MoO2 layer which roughens by the formation of (110) facets under further oxygen exposure. (C) 2004 Elsevier B.V. All rights reserved.
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页码:85 / 97
页数:13
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