XPD and STM investigation of hexagonal boron nitride on Ni(111)

被引：206

作者：

Auwärter, W ^{[1
]}

Kreutz, TJ ^{[1
]}

Greber, T ^{[1
]}

Osterwalder, J ^{[1
]}

机构：

[1] Univ Zurich, Inst Phys, CH-8057 Zurich, Switzerland

来源：

SURFACE SCIENCE | 1999年 / 429卷 / 1-3期

关键词：

scanning tunneling microscopy; surface structure; X-ray photoelectron diffraction;

D O I：

10.1016/S0039-6028(99)00381-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Monolayers of hexagonal boron nitride have been grown by the reaction of benzene-like borazine (BN)(3)H-6 with Ni(111) at 1050 K. The resulting layers are analyzed by means of Si K alpha excited N 1s and B 1s X-ray photoelectron diffraction (XPD) and scanning tunneling microscopy (STM). STM shows large terraces without defects and resolves two different atomic species that are commensurate with Ni(lll). From XPD it is found that the system discriminates fee from hcp adsorption sites, that the h-BN layer is corrugated and that nitrogen terminates the surface. The B-N corrugation is determined quantitatively by R-factor analysis between single scattering cluster calculations and experiment. The results are discussed in connection with an existing LEED analysis on the same system [Y. Gamou, M. Terai, A. Nagashima, C. Oshima, Sci. Rep. RITU A 44 (1997) 211]. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：229 / 236

页数：8

共 18 条

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