Atomic layer deposition and biocompatibility of titanium nitride nano-coatings on cellulose fiber substrates

Atomic layer deposition (ALD) is investigated as a process to produce inorganic metallic bio-adhesive coatings on cellulosic fiber substrates. The atomic layer deposition technique is known to be capable of forming highly conformal and uniform inorganic thin film coatings on a variety of complex surfaces, and this work presents an initial investigation of ALD on porous substrate materials to produce high-precision biocompatible titanium oxynitride coatings. X-ray photoelectron spectroscopy (XPS) confirmed TiNOx composition, and transmission electron microscopy (TEM) analysis showed the coatings to be uniform and conformal on the fiber surfaces. Biocompatibility of the modified structures was determined as a function of coating layer thickness by fluorescent live/dead staining of human adipose-derived adult stem cells (hADSC) at 6, 12 and 24 h. Cell adhesion showed that thin TiNOx coatings yielded the highest number of cells after 24 h with a sample coated with a 20 angstrom coating having approximately 28.4 +/- 3.50 ng DNA. By altering the thickness of the deposited film, it was possible to control the amount of cells adhered to the samples. This work demonstrates the potential of low temperature ALD as a surface modification technique to produce biocompatible cellulose and other implant materials.