Interface characterization and indium content of indium-rich quantum dots in InGaN/GaN multiple quantum wells

被引:11
作者
Liu, CP [1 ]
Lai, YL
Chen, ZQ
机构
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan
[2] Genesis Photon Inc, Tainan 701, Taiwan
关键词
InGaN/GaN;
D O I
10.1016/j.apsusc.2005.09.024
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report on the interface characterization of InGaN/GaN multiple quantum wells with indium aggregation grown by metalorganic chemical vapor deposition. The interface related microstructure was analyzed by high-resolution transmission electron microscopy, high-resolution X-ray diffraction and high angle annular dark field. Luminescence measurements were carried out by micro-photoluminescence measurement. In addition, quantitative determination of the indium concentration inside the ultra-small dots was attempted. We demonstrate that the quantum dots are coherent and the interfaces remain sharp. The In content inside similar to 2 nm InGaN dots is about 65% determined by spectrum imaging in energy filtered transmission electron microscopy combined with multiple linear least squares fitting, which is slighter higher than the value obtained either from HRTEM or theoretical calculations. This discrepancy is briefly discussed but demands further studies for complete understanding. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:3922 / 3927
页数:6
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