A sub-40-ns chain FRAM architecture with 7-ns cell-plate-line drive

被引:11
作者
Takashima, D [1 ]
Shuto, S
Kunishima, I
Takenaka, H
Oowaki, Y
Tanaka, S
机构
[1] Toshiba Corp, Ctr Res & Dev, Kawasaki, Kanagawa 2108582, Japan
[2] Toshiba Corp, Microelect Engn Labs, Yokohama, Kanagawa, Japan
[3] Toshiba Microelect Corp, Yokohama, Kanagawa, Japan
关键词
ferroelectric memory; nonvolatile; random access memory; fatigue;
D O I
10.1109/4.799863
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A nonvolatile chain FRAM adopting a new cell-plate-line drive technique was demonstrated. Two key circuit techniques, a two-way metal cell-plate line and a cell-plate line shared with 16 cells, reduce cell-plate-line delay to 7 ns and reduce plate drive area to 1/5, The total cell-plate-line delay, including cell transistor delay due to eight cells in series, is reduced to lj ns, in contrast to 30-100-ns delay of the conventional FRAM. The die size is reduced to 86% that of the conventional FRAM by reduction of the plate driver area and sense amplifier area, assuming the same memory cell size. A prototype 16-kb chain FRAM chip was fabricated using 0.5-mu m rule one-polycide and two-metal CMOS process, The memory cell size was 13.26 mu m(2) using a 3.24-mu m(2) capacitor. Thanks to the fast cell-plate-line drive, the chain FRAM test chip has achieved the fastest random access time, 37 ns, and read/write cycle time, 80 ns, at 3.3 V so far reported. The chain FRAM has also realized V-dd min of 2.3 V and 10(10) read/write cycles.
引用
收藏
页码:1557 / 1563
页数:7
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