High-density chain ferroelectric random access memory (chain FRAM)

被引:46
作者
Takashima, D [1 ]
Kunishima, I
机构
[1] Toshiba Corp, Adv Semicond Devices Res Labs, Yokohama, Kanagawa 235, Japan
[2] Toshiba Corp, Microelect Engn Lab, Kawasaki, Kanagawa 210, Japan
关键词
ferroelectric memory; nonvolatile; random access memories;
D O I
10.1109/4.668994
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new chain ferroelectric random access memory-a chain FRAM-has been proposed. A memory cell consists of parallel connection of one transistor and one ferroelectric capacitor, and one memory cell block consists of plural memory cells connected in series and a block selecting transistor. This configuration realizes the smallest 4 F-2 size memory cell using the planar transistor so far reported, and random access, The chip size of the proposed chain FRAM can be reduced to 63% of that of the conventional FRAM when 16 cells are connected in series. The fast nondriven half-V-dd cell-plate scheme, as well as the driven cell-plate scheme, are applicable to the chain FRAM without polarization switching during the standby cycle thanks to short-circuiting ferroelectric capacitors. It results in fast access time of 45 ns and cycle time of 70 ns without refresh operation.
引用
收藏
页码:787 / 792
页数:6
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