Complete thermal characterization of film-on-substrate system by modulated thermoreflectance microscopy and multiparameter fitting

被引:61
作者
Li, BC [1 ]
Roger, JP [1 ]
Pottier, L [1 ]
Fournier, D [1 ]
机构
[1] Univ Paris 06, Lab Instrumentat, ESPCI,Lap Opt, CNRS,UPR A0005, F-75005 Paris, France
关键词
D O I
10.1063/1.371520
中图分类号
O59 [应用物理学];
学科分类号
摘要
Modulated thermoreflectance microscopy is applied to a complete thermal characterization of a thin film of gold (78 nm) or YBaCuO (300 nm) on a LaAlO3 substrate. The phase profile, measured at several modulation frequencies covering an appropriate range, is fitted with a rigorous thermal diffusion model. This leads to a simultaneous estimation of the thermal diffusivities of the film and the substrate, as well as of the thermal film/substrate boundary resistance. The estimated values for the gold film sample are, respectively, 4.3x10(-6) m(2) s(-1) (substrate diffusivity), 1.0x10(-4) m(2) s(-1) (film diffusivity), and 1.0x10(-8) m(2) KW-1 (thermal boundary resistance), while for the thermally anisotropic YBaCuO film sample are, 4.1x10(-6) m(2) s(-1), 3.5x10(-6) m(2) s(-1) (in-plane diffusivity), and 8.0x10(-8) m(2) KW-1, respectively. (C) 1999 American Institute of Physics. [S0021-8979(99)08218-3].
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页码:5314 / 5316
页数:3
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