Pulsed laser deposition of NiTi shape memory effect thin films

被引:27
作者
Ciabattari, F
Fuso, F
Arimondo, E
机构
[1] Unita Ist. Naz. Fis. della Materia, Dipartimento di Fisica, Università di Pisa, I-56126 Pisa
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1997年 / 64卷 / 06期
关键词
D O I
10.1007/s003390050528
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report for the first time on the pulsed laser deposition of NiTi shape-memory effect thin films. Using a NiTi bulk target with a 1:1 nominal stoichiometry, we deposited thin films (thickness approximate to 0.6 mu m) on both Si(100) and Al2O3(100) substrates. We also produced free-standing NiTi films by deposition on KBr substrates and subsequent substrate removal by immersion in water. The presence of the solid-solid phase transformation responsible for the shape memory effect has been demonstrated through temperature-dependent X-ray diffraction and four-probe resistance versus temperature measurements. On cooling the deposited him, the austenite-martensite transformation was measured at around 195 K; on heating the film the reverse transformation was around 250 K. Evidence of the shape-memory effect for freestanding films was obtained in a bending deformation-shape recovery experiment.
引用
收藏
页码:623 / 626
页数:4
相关论文
共 21 条
[1]  
AUCIELLO O, 1989, BEAM MODIFICATIONS M, V1
[2]   DIAGNOSTICS OF YBA2CU3O7-DELTA LASER PLUME BY TIME-OF-FLIGHT MASS-SPECTROMETRY [J].
BERARDI, V ;
AMORUSO, S ;
SPINELLI, N ;
ARMENANTE, M ;
VELOTTA, R ;
FUSO, F ;
ALLEGRINI, M ;
ARIMONDO, E .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (12) :8077-8087
[3]   SHAPE-MEMORY PROPERTIES IN NI-TI SPUTTER-DEPOSITED FILM [J].
BUSCH, JD ;
JOHNSON, AD ;
LEE, CH ;
STEVENSON, DA .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (12) :6224-6228
[4]   ORIENTED NICKEL-TITANIUM SHAPE MEMORY ALLOY-FILMS PREPARED BY ANNEALING DURING DEPOSITION [J].
GISSER, KRC ;
BUSCH, JD ;
JOHNSON, AD ;
ELLIS, AB .
APPLIED PHYSICS LETTERS, 1992, 61 (14) :1632-1634
[5]  
HOU L, 1995, MATER RES SOC SYMP P, V360, P369
[6]   IN-SITU DIAGNOSTICS OF PULSED-LASER DEPOSITION OF FERROELECTRIC PB(TI0.48ZR0.52)O3 ON SI [J].
IEMBO, A ;
FUSO, F ;
ALLEGRINI, M ;
ARIMONDO, E ;
BERARDI, V ;
SPINELLI, N ;
LECCABUE, F ;
WATTS, BE ;
FRANCO, G ;
CHIORBOLI, G .
APPLIED PHYSICS LETTERS, 1993, 63 (09) :1194-1196
[7]  
JARDINE AP, 1995, MATER RES SOC SYMP P, V360, P293
[8]   CHARACTERIZATION OF THE DEPOSITION AND MATERIALS PARAMETERS OF THIN-FILM TINI FOR MICROACTUATORS AND SMART MATERIALS [J].
JARDINE, AP ;
MADSEN, JS ;
MERCADO, PG .
MATERIALS CHARACTERIZATION, 1994, 32 (03) :169-178
[9]   PULSED-LASER DEPOSITION OF THIN METALLIC ALLOYS [J].
KREBS, HU ;
BREMERT, O .
APPLIED PHYSICS LETTERS, 1993, 62 (19) :2341-2343
[10]   PULSED-LASER DEPOSITION OF METAL AND METAL MULTILAYER FILMS [J].
LUNNEY, JG .
APPLIED SURFACE SCIENCE, 1995, 86 (1-4) :79-85