Adsorption properties of CFC and CFC replacements on activated carbon containing introduced ionic fluoride and chloride

Plasma technology has been available for the chlorofluorocarbon (CFC) decomposition or etching of silicone, The adsorption properties of CFC (CFC113) and CFC replacements (HCFC141b, HCFC225cb, and 5FP) on several kinds of plasma-treated activated carbons (P-ACs) prepared under different treatment gases were investigated using the adsorption isotherms, the limiting pore volume (W-o) and the affinity coefficient and energy of adsorption (BE(o)) calculated by the Dubinin-Radushkevich plot, and the quality and kinds of introduced fluoride and chloride, The dissolved fluoride and chloride atoms were introduced to the surface of activated carbon by CFC113, HCFC141b, and HCFC225cb, while the dissolved fluoride atoms were those from 5FP and tetrafluoromethane, The adsorbed amount of CFC and CFC replacements, except for 5FP, on P-ACs was larger than that on U-AC, The specific adsorption site on plasma-treated activated carbon of the CFC and CFC replacements was the fluoride atoms which were introduced by plasma treatment. It is concluded that the plasma-treated activated carbon was suitable for the recovery of CFC and CFC replacements, because the adsorbed amount of CFC and CFC replacements was larger than that on untreated activated carbon, and the adsorbed CFC and CFC replacements on activated carbon were decomposed by the plasma treatment. (C) 1996 Academic Press, Inc.