Comparison of AlGaN/GaN high electron mobility transistors grown on AlN/SiC templates or sapphire

被引:20
作者
Johnson, JW
Han, J
Baca, AG
Briggs, RD
Shul, RJ
Wendt, JR
Monier, C
Ren, F
Luo, B
Chu, SNG
Tsvetkov, D
Dmitriev, V
Pearton, SJ
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Yale Univ, Dept Elect Engn, New Haven, CT 06520 USA
[3] Sandia Natl Labs, Albuquerque, NM 87185 USA
[4] Agere Syst, Murray Hill, NJ 07974 USA
[5] TDI Inc, Gaithersburg, MD 20877 USA
[6] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
基金
美国国家科学基金会;
关键词
GaN; AlGaN; AlN; SiC; HEMT; AFM; TEM; mobility;
D O I
10.1016/S0038-1101(01)00284-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The temperature and gate length effects on dc performance of AlGaN/GaN high-electron mobility transistors (HEMTs) grown on AlN/SiC templates or sapphire substrates are reported. The defect density in the structures grown on the AlN/SiC template is significantly lower than those grown on sapphire, as measured by transmission electron microscopy. Reverse breakdown voltages above 40 V were obtained for 0.25 mum gate length devices on both types of substrate. Extrinsic transconductances of similar to200 mS/mm for HEMTs on sapphire and similar to125 mS/mm for devices on AlN/ SiC were achieved, with the latter devices showing significantly lower self-heating effects. Both types of HEMTs showed similar trends of drain current and transconductance with increasing temperature. There was a clear signature of optical phonon scattering as the dominant scattering mechanism from room temperature to 300 degreesC. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:513 / 523
页数:11
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