Growth processes of particles in high frequency silane plasmas

被引:69
作者
Watanabe, Y
Shiratani, M
Kawasaki, H
Singh, S
Fukuzawa, T
Ueda, Y
Ohkura, H
机构
[1] Department of Electrical Engineering, Faculty of Engineering, Kyushu University, Higashi-ku
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 02期
关键词
D O I
10.1116/1.580141
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Growth processes of particles in high frequency silane plasmas are studied as a parameter of discharge frequency (3.5-28 MHz) or by modulating the amplitude of discharge voltage (125-275 V). Except for the 28 MHz case, particles tend to grow through three phases of nucleation and subsequent initial growth, rapid growth, and growth saturation. A detailed study for 6.5 MHz explains the following features: morphology of particles shows that coagulation of particles plays a crucial role in the rapid growth phase; a coagulation rate of 200 s(-1) observed in the rapid growth phase is extremely high compared to a thermal collision rate of 5 s(-1) between particles; coagulation almost stops when decreasing the discharge power by about one-fourth at the middle of the rapid growth phase; two size groups of particles with narrow size dispersions coexist during and after the rapid growth phase. For 28 MHz, while, as compared to 6.5 MHz, particles appear early after the initiation of discharge and their density is high by about two orders, their growth rate in the subsequent phase is quite low. To properly explain most rapid growth features, a model, taking into account coagulation between oppositely charged particles, is proposed. (C) 1996 American Vacuum Society.
引用
收藏
页码:540 / 545
页数:6
相关论文
共 23 条
[1]   Particle nucleation and growth in a low-pressure argon-silane discharge [J].
Boufendi, L. ;
Bouchoule, A. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :262-267
[2]  
BOUFENDI L, 1993, PLASMA SOURCES SCI T, V2, P204
[3]   LOW-ENERGY-ELECTRON ATTACHMENT TO CLUSTERS OF NITRIC-OXIDE [J].
CARMAN, HS .
JOURNAL OF CHEMICAL PHYSICS, 1994, 100 (04) :2629-2636
[4]   FLUCTUATIONS OF THE CHARGE ON A DUST GRAIN IN A PLASMA [J].
CUI, CS ;
GOREE, J .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1994, 22 (02) :151-158
[5]   POWDER DYNAMICS IN VERY HIGH-FREQUENCY SILANE PLASMAS [J].
DORIER, JL ;
HOLLENSTEIN, C ;
HOWLING, AA ;
KROLL, U .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1992, 10 (04) :1048-1052
[6]   NOVEL IN-SITU METHOD TO DETECT SUBNANOMETER-SIZED PARTICLES IN PLASMAS AND ITS APPLICATION TO PARTICLES IN HELIUM-DILUTED SILANE RADIO-FREQUENCY PLASMAS [J].
FUKUZAWA, T ;
SHIRATANI, M ;
WATANABE, Y .
APPLIED PHYSICS LETTERS, 1994, 64 (23) :3098-3100
[7]  
FUKUZAWA T, 1995, P S PLASMA PROCESS, V12, P385
[8]   DUSTY PLASMAS IN THE SOLAR-SYSTEM [J].
GOERTZ, CK .
REVIEWS OF GEOPHYSICS, 1989, 27 (02) :271-292
[9]   Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scattering [J].
Hollenstein, Ch ;
Dorier, J-L ;
Dutta, J. ;
Sansonnens, L. ;
Howling, A. A. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :278-285
[10]   INVESTIGATION OF PARTICULATE GROWTH-PROCESSES IN RF SILANE PLASMAS USING LIGHT-ABSORPTION AND SCANNING ELECTRON-MICROSCOPIC METHODS [J].
KAWASAKI, H ;
FUKUZAWA, T ;
TSURUOKA, H ;
YOSHIOKA, T ;
SHIRATANI, M ;
WATANABE, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B) :4198-4201